Effect of Hf alloying on magnetic, structural, and magnetostrictive properties in FeCo films for magnetoelectric heterostructure devices

Abstract

Materials with high magnetoelectric coupling are attractive for use in engineered multiferroic heterostructures with applications such as ultra-low power magnetic sensors, parametric inductors, and non-volatile random-access memory devices. Iron–cobalt alloys exhibit both high magnetostriction and high saturation magnetization that are required for achieving significantly higher magnetoelectric coupling. We report on sputter-deposited (Fe0.5Co0.5)1−xHfx (x = 0 – 0.14) alloy thin films and the beneficial influence of Hafnium alloying on the magnetic and magnetostrictive properties. We found that co-sputtering Hf results in the realization of the peening mechanism that drives film stress from highly tensile to slightly compressive. Scanning electron microscopy and x-ray diffraction along with vibrating sample magnetometry show reduction in coercivity with Hf alloying that is correlated with reduced grain size and low film stress. We demonstrate a crossover from tensile to compressive stress at x ∼ 0.09 while maintaining a high magnetostriction of 50 ppm and a low coercive field of 1.1 Oe. These characteristics appear to be related to the amorphous nature of the film at higher Hf alloying.