Plasma-Deposited Fluorocarbon Coatings on Methylammonium Lead Iodide Perovskite Films

Abstract

Metal halide perovskites are excellent semiconductors materials that can be exploited in many fields, from the vastly explored photovoltaics to the recent applications in photocatalysis. One of the material’s known limitations is the poor resistance to moisture which induces degradation, triggered by the soft and defective nature of its surface. In this study, we explore non-equilibrium plasmas, to deposit a fluorocarbon polymer on the surface of a MAPbI3 film. We found that the treatment generally enhances the film stability over time, and in certain conditions it improves the perovskite optical properties, demonstrating to be a good strategy aiming defects passivation. Thanks to the solvent-free and non-invasive nature of plasmas, this technique has the potential to be extensively applied to a wide range of perovskite materials targeting different applications.

Keywords

• plasma deposition
• fluorocarbon coating
• metal halide perovskite
• methylammonium lead iodide film
• perovskite stability