Unscrambling for Subgap Density-of-States in Multilayered MoS₂ Field Effect Transistors under DC Bias Stress via Optical Charge-Pumping Capacitance-Voltage Spectroscopy

Abstract

Herein, we quantitatively analyze the evolution of the subgap density of states (DOSs) for multilayered molybdenum disulfide (m-MoS2) field effect transistors (FETs) with bilayered SiNx/SiOx gate dielectrics under positive bias stress (PBS) and negative bias stress (NBS) by using optical charge-pumping capacitance-voltage spectroscopy. To decouple external gas ambient effects on device instability, hydrophobic fluoropolymers (cyclized transparent optical polymer; CYTOP) are employed for m-MoS2 FETs followed by the evaluation of subgap-DOSs in the devices for the respective PBS (or NBS). Through extraction of subgap-DOSs and their deconvolution with an analytical model of acceptor (or donor)-like states, it is shown that the device instability is closely correlated with state transitions of DOSs, corresponding to shallow (or midgap) levels for monosulfur vacancy (VS) (or disulfur vacancy ( $\text{V}_{\mathrm {S2}}$ )). Moreover, after PBS, the initial states of VS(0) (or $\text{H}_{\mathrm {S2}}$ (0)) transit toward VS (−1) (or $\text{H}_{\mathrm {S2}}(-1$ )) via electron trapping, whereas the transition toward VS (0) and $\text{H}_{\mathrm {S2}}$ (+1) during NBS is assessed from the initial $\text{V}_{\mathrm {S}}(-1$ ) and $\text{H}_{\mathrm {S2}}$ (0) states. Furthermore, technology computer-aided design (TCAD) simulation based on the extracted DOSs properly replicates the measured I-V characteristics of m-MoS2 FETs with (and without) CYTOP encapsulation. In this study, subgap-DOS characterization via optical charge pumping and validation of the quantitative evolution of subgap-DOSs suggest that this platform can be potentially beneficial for an in-depth understanding of the origins of device instability for transition metal dichalcogenide (MX2)-based FETs, where M is a transition metal and X is a chalcogenide.

Keywords

• MoS₂
• field effect transistor
• density of state (DOS)
• bias stress instability
• TCAD simulation