In situ atomistic observation of disconnection-mediated grain boundary migration

Qi Zhu; Guang Cao; Jiangwei Wang; Chuang Deng; Jixue Li; Ze Zhang; Scott X. Mao

doi:10.1038/s41467-018-08031-x

Nature Communications (Jan 2019)

In situ atomistic observation of disconnection-mediated grain boundary migration

Qi Zhu,
Guang Cao,
Jiangwei Wang,
Chuang Deng,
Jixue Li,
Ze Zhang,
Scott X. Mao

Affiliations

Qi Zhu: Center of Electron Microscopy and State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University
Guang Cao: Center of Electron Microscopy and State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University
Jiangwei Wang: Center of Electron Microscopy and State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University
Chuang Deng: Department of Mechanical Engineering, University of Manitoba
Jixue Li: Center of Electron Microscopy and State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University
Ze Zhang: Center of Electron Microscopy and State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University
Scott X. Mao: Department of Mechanical Engineering and Materials Science, University of Pittsburgh

DOI: https://doi.org/10.1038/s41467-018-08031-x
Journal volume & issue: Vol. 10, no. 1
pp. 1 – 8

Abstract

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Shear-induced grain boundary migration at the atomic level is still not well understood. Here the authors combine in situ shear testing experiments and molecular dynamic simulations to reveal the atomistic mechanism of disconnection-mediated GB migration in different gold nanostructures.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

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