Proceedings (Aug 2017)

Development of All-Around SiO2/Al2O3 Gate, Suspended Silicon Nanowire Chemical Field Effect Transistors Si-nw-ChemFET

  • Ahmet Lale,
  • Auriane Grappin,
  • Laurent Mazenq,
  • David Bourrier,
  • Aurélie Lecestre,
  • Jérôme Launay,
  • Pierre Temple-Boyer

DOI
https://doi.org/10.3390/proceedings1040419
Journal volume & issue
Vol. 1, no. 4
p. 419

Abstract

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We present a sensor platform associated to silicon-nanowire chemical field effect transistors (Si-nw-ChemFET). Innovations concern the use of networks of suspended silicon N+/P/N+ nanowires as conducting channel, the realization by thermal oxidation and Atomic-Layer Deposition (ALD) of a SiO2/Al2O3 gate insulator all-around the silicon nanowires, and their final integration into covered SU8-based microfluidic channels. The Si-nw-MOSFET/ChemFET fabrication process and electrical/electrochemical characterizations are presented. The fabrication process did not need an expensive and time-consuming e-beam lithography, but only fast and “low cost” standard photolithography protocols. Such microdevice will provide new opportunities for bio-chemical analysis at the micro/nanoscale.

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