AIP Advances (Oct 2014)

High-quality NbN nanofilms on a GaN/AlN heterostructure

  • Diane Sam-Giao,
  • Stéphanie Pouget,
  • Catherine Bougerol,
  • Eva Monroy,
  • Alexander Grimm,
  • Salha Jebari,
  • Max Hofheinz,
  • J.-M. Gérard,
  • Val Zwiller

DOI
https://doi.org/10.1063/1.4898327
Journal volume & issue
Vol. 4, no. 10
pp. 107123 – 107123-6

Abstract

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We demonstrate high-quality monocrystalline NbN films deposited by DC magnetron sputtering on a GaN/AlN waveguiding heterostructure. NbN layers with a thickness of 8 nm are grown along the [111] direction, and show two orientation domains with NbN(111) [2-1-1]//AlN (0001) [10-10] and NbN(111) [2-1-1]//AlN(0001) [01-10] epitaxial relationships. Our NbN films display a critical temperature of 13.2 K, with the superconducting transition taking place in a temperature range of only 0.7 K.