Excellent near-infrared transmission of Zr-based thin film metallic glasses

Abstract

Zr50Cu50, Zr47Cu44Al9, Zr46.3Cu43.4Al8.3Nb2 and Zr41.2Ti13.8Cu17.5Ni5Be22.5 thin film metallic glasses (TFMGs) were prepared by pulsed laser deposition (PLD) on glass substrates at room temperature. The effect of thickness on the electrical and optical properties of the Zr-based TFMGs was investigated. It was found that the resistivity of the Zr-based TFMGs basically decreased as the thickness varied from 10 nm to 40 nm. Interestingly, while the transmittance in the visible region decreased significantly with the increase of thickness, the transmittance in the near-infrared range still remained at a high level of larger than 80%. Through the characterization of electrical properties, the high transmittance of the Zr-based TFMGs in the near-infrared range was attributed to their rather low carrier concentration. Our findings provided the possibility for TFMGs to be used as transparent electrodes in the field of near infrared sensors and solar cells. Keywords: Thin film metallic glass, Zr-based alloys, Transmittance, Near infrared