Influence of Substrate Surface Characteristics on Chromium Plating Layer

Abstract

In order to clarify the influence of the surface characteristics of the substrate on the chromium plating layer formed on the surface during the chromium plating process， the surface states of different substrates were characterized by X-ray photoelectron spectroscopy (XPS)，X-ray diffraction (XRD)， field emission scanning electron microscopy (FESEM)， atomic force microscopy (AFM) and electrochemical test.Results showed that lower surface roughness and more peaks provided more active sites for the deposition of chromium-containing compounds on the substrate surface， which promoted the growth of the chromium plating layer. The grain orientation on the substrate surface would affect the growth of chromium-containing compounds， precisely， higher grain orientation complexity would lead to more defects in the chromium plating layer. Besides， larger oxide film thickness on the surface of the substrate would lead to worse chemical activity of the surface and poorer chromium plating layer quality.

Keywords

• roughness|grain orientation|oxide film|chromium plating layer