Investigation of the Atomic Layer Deposition of the Titanium Dioxide (TiO₂) Film as pH Sensor Using a Switched Capacitor Amplifier

Abstract

The electrical and chemical properties of the titanium dioxide (TiO2) coated spirals grown by the atomic layer deposition (ALD) technique in two different temperatures of 150 °C and 300 °C are studied. The thickness of the TiO2 layers studied are 20, 40, and 80 nm. A switched capacitor amplifier is used to investigate the pH response and the capacitance of the samples. It is found that the performance of the TiO2 samples depends on either the thickness or the deposition temperature due to the differences in the physical properties of the oxide layer such as surface roughness and film density. The high temperature samples are more crystalline, whereas the low temperature samples are more amorphous. Since there is a low pass filter effect in the electrolyte–sample interface, the TiO2 coated samples show the better response to the pH change for the high temperature samples as the sensor surface area for binding the hydrogen ions is larger and the charge transfer resistance is smaller. Furthermore, more roughness on the surface can be obtained by increasing the thickness, which reduces the charge transfer resistance. In this study, the 80 nm sample deposited at 300 °C gives the best pH response of 40 mV/pH.

Keywords

• atomic layer deposition
• counter electrode
• charge transfer resistance
• pH sensor
• reference electrode
• surface roughness