Micromachines (Oct 2024)

Strain-Induced Frequency Splitting in PT Symmetric Coupled Silicon Resonators

  • Lifeng Wang,
  • Shangyang Zhang,
  • Qunce Yuan

DOI
https://doi.org/10.3390/mi15101278
Journal volume & issue
Vol. 15, no. 10
p. 1278

Abstract

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When two resonators of coupled silicon resonators are identical and the gain on one side is equal to the loss on the other side, a parity-time (PT) symmetric-coupled silicon resonator is formed. As non-Hermitian systems, the PT-symmetric systems have exhibited many special properties and interesting phenomena. This paper proposes the strain-induced frequency splitting in PT symmetry-coupled silicon resonators. The frequency splitting of the PT system caused by strain perturbations is derived and simulated. Theory and simulation both indicate that the PT system is more sensitive to strain perturbation near the exceptional point (EP) point. Then, a feedback circuit is designed to achieve the negative damping required for PT symmetry. Based on a simple silicon-on-insulator (SOI) process, the silicon resonator chip is successfully fabricated. After that, the PT-symmetric-coupled silicon resonators are successfully constructed, and the frequency splitting phenomenon caused by strain is observed experimentally.

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