Controlling the Size and Pattern Pitch of Ni(OH)<sub>2</sub> Nanoclusters Using Dip-Pen Nanolithography to Improve Water Oxidation

Zorik Shamish; Moshe Zohar; Dror Shamir; Ariela Burg

doi:10.3390/molecules25122937

Molecules (Jun 2020)

Controlling the Size and Pattern Pitch of Ni(OH)<sub>2</sub> Nanoclusters Using Dip-Pen Nanolithography to Improve Water Oxidation

Zorik Shamish,
Moshe Zohar,
Dror Shamir,
Ariela Burg

Affiliations

Zorik Shamish: Department of Chemical Engineering, Shamoon College of Engineering, P.O. Box 950, Beer-Sheva 8410802, Israel
Moshe Zohar: Department of Electrical and Electronics Engineering, Shamoon College of Engineering, P.O. Box 950, Beer-Sheva 8410802, Israel
Dror Shamir: Nuclear Research Center, Negev, P.O. Box 9001, Beer-Sheva 8419001, Israel
Ariela Burg: Department of Chemical Engineering, Shamoon College of Engineering, P.O. Box 950, Beer-Sheva 8410802, Israel

DOI: https://doi.org/10.3390/molecules25122937
Journal volume & issue: Vol. 25, no. 12
p. 2937

Abstract

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We use dip-pen nanolithography to accurately pattern Ni(OH)2 nanoclusters on a metachemical surface with an exceptionally large surface area. The distance between the nanoclusters can be manipulated to control the oxygen-evolution reaction current and overpotential, thereby improving the efficiency of the water-splitting process while using minute amounts of the catalyst.

Published in Molecules

ISSN: 1420-3049 (Online)
Publisher: MDPI AG
Country of publisher: Switzerland
LCC subjects: Science: Chemistry: Organic chemistry
Website: http://www.mdpi.com/journal/molecules

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