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Química Nova
(Feb 1998)
Modelagem dos processos químicos em plasmas de misturas gasosas usadas na corrosão de silício. Parte 1: CF4 / O2
G. F. Bauerfeldt,
G. Arbilla
Affiliations
G. F. Bauerfeldt
Universidade Federal do Rio de Janeiro
G. Arbilla
Universidade Federal do Rio de Janeiro
DOI
https://doi.org/10.1590/S0100-40421998000100005
Journal volume & issue
Vol. 21, no. 1
pp. 25 – 33
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