Nature Communications (Feb 2024)

Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

  • Qiyu Yang,
  • Zheng-Dong Luo,
  • Huali Duan,
  • Xuetao Gan,
  • Dawei Zhang,
  • Yuewen Li,
  • Dongxin Tan,
  • Jan Seidel,
  • Wenchao Chen,
  • Yan Liu,
  • Yue Hao,
  • Genquan Han

DOI
https://doi.org/10.1038/s41467-024-45482-x
Journal volume & issue
Vol. 15, no. 1
pp. 1 – 10

Abstract

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Abstract Two-dimensional (2D) semiconductor-based vertical-transport field-effect transistors (VTFETs) – in which the current flows perpendicularly to the substrate surface direction – are in the drive to surmount the stringent downscaling constraints faced by the conventional planar FETs. However, low-power device operation with a sub-60 mV/dec subthreshold swing (SS) at room temperature along with an ultra-scaled channel length remains challenging for 2D semiconductor-based VTFETs. Here, we report steep-slope VTFETs that combine a gate-controllable van der Waals heterojunction and a metal-filamentary threshold switch (TS), featuring a vertical transport channel thinner than 5 nm and sub-thermionic turn-on characteristics. The integrated TS-VTFETs were realised with efficient current switching behaviours, exhibiting a current modulation ratio exceeding 1 × 108 and an average sub-60 mV/dec SS over 6 decades of drain current. The proposed TS-VTFETs with excellent area- and energy-efficiency could help to tackle the performance degradation-device downscaling dilemma faced by logic transistor technologies.