Symmetry (Dec 2021)

The Fractal Geometry of TiAlNiAu Thin Film Metal System and Its Sheet Resistance (Lateral Size Effect)

  • Nikolay Anatolyevich Torkhov,
  • Maxim Pavlovich Evstigneev,
  • Andrey Alexandrocivh Kokolov,
  • Leonid Ivanovich Babak

DOI
https://doi.org/10.3390/sym13122391
Journal volume & issue
Vol. 13, no. 12
p. 2391

Abstract

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This paper investigates the relation between the geometry of metric space of a TiAlNiAu thin film metal system and the geometry of normed functional space of its sheet resistances (functionals), which are elements of the functional space. The investigation provides a means to describe a lateral size effect that involves a dependency in local approximation of sheet resistance Rsq of TiAlNiAu metal film on its lateral linear dimensions (in (x,y) plane). This dependency is defined by fractal geometry of dendrites, or, more specifically, it is a power-law dependency on fractal dimension Df value. The revealed relation has not only fundamental but also a great practical importance both for a precise calculation of thin film metal system Rsq values in designing discreet devices and ICs, and for controlling results at micro- and nanoscale in producing workflow for thin metal films and systems based on them.

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