Materials (Jan 2019)

The Reaction Thermodynamics during Plating Al on Graphene Process

  • Zhanyong Zhao,
  • Peikang Bai,
  • Liang Li,
  • Jing Li,
  • Liyun Wu,
  • Pengcheng Huo,
  • Le Tan

DOI
https://doi.org/10.3390/ma12020330
Journal volume & issue
Vol. 12, no. 2
p. 330

Abstract

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This research explored a novel chemical reduction of organic aluminum for plating Al on a graphene surface. The thermodynamics of the Al plating reaction process were studied. The Al plating process consisted of two stages: the first was to prepare (C2H5)3Al. In this reaction, the ΔH(enthalpy) was 10.64 kcal/mol, the ΔG(Gibbs free energy) was 19.87 kcal/mol and the ΔS(entropy) was 30.9 cal/(mol·K); this was an endothermic reaction. In the second stage, the (C2H5)3Al decomposed into Al atoms, which were gradually deposited on the surface of the graphene and the Al plating formed. At 298.15 K, the ΔH was −20.21 kcal/mol, the ΔG was −54.822 kcal/mol, the ΔS was 116.08 cal/(mol·K) and the enthalpy change was negative, thus indicating an endothermic reaction.

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