Proceedings (Jun 2019)
Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
Abstract
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method inwhich high-quality [...]
Keywords