Fast Cross-Linking-Characterization of Waveguide-Polymers on Wafers by Imaging Low-Coherence Interferometry

Abstract

This work introduces a novel method to characterize cross-linking differences in spincast polymers for waveguide applications. The method is based on a low-coherence interferometer which utilizes an imaging spectrometer to gather spatially resolved data along a line without the need for scanning. The cross-linking characterization is performed by the determination of the wavelength-dependent optical thickness. In order to do this, an algorithm to analyze the wrapped phase data and extract refractive index information is developed. Finally, the approach is tested on photo-lithographically produced samples with lateral refractive index differences in pitches of 50 μm.

Keywords

• interferometry
• cross-linking characterization
• white-light interferometry
• dispersionenhanced low-coherence interferometry
• photoresist
• semiconductor manufacturing