AIP Advances (Aug 2013)

Erratum: “Effect of thermal annealing on Boron diffusion, micro-structural, electrical and magnetic properties of laser ablated CoFeB thin films” [AIP Advances 3, 072129 (2013)]

  • G. Venkat Swamy,
  • Himanshu Pandey,
  • A. K. Srivastava,
  • M. K. Dalai,
  • K. K. Maurya,
  • Rashmi,
  • R. K. Rakshit

DOI
https://doi.org/10.1063/1.4820356
Journal volume & issue
Vol. 3, no. 8
pp. 089901 – 089901

Abstract

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