Chemical vapour deposition of diamond using low pressure flat combustion flame

Abstract

Diamond coatings were deposited ontoMo and WC–Co substrates using a low pressure premixed acetylene–oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of ' 7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to ' 1 mm. Upon machining an Al–12 % Si alloy under identical conditions, the diamond coated WC–Co cutting tool inserts showed 30 % less wear than the as-received inserts.

Keywords

• low pressure flat flame
• Diamond CVD