Nature Communications (Mar 2023)

Top-down patterning of topological surface and edge states using a focused ion beam

  • Abdulhakim Bake,
  • Qi Zhang,
  • Cong Son Ho,
  • Grace L. Causer,
  • Weiyao Zhao,
  • Zengji Yue,
  • Alexander Nguyen,
  • Golrokh Akhgar,
  • Julie Karel,
  • David Mitchell,
  • Zeljko Pastuovic,
  • Roger Lewis,
  • Jared H. Cole,
  • Mitchell Nancarrow,
  • Nagarajan Valanoor,
  • Xiaolin Wang,
  • David Cortie

DOI
https://doi.org/10.1038/s41467-023-37102-x
Journal volume & issue
Vol. 14, no. 1
pp. 1 – 8

Abstract

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Topological edge states offer the prospect of dissipationless transport for nanoelectronics, but a precise method to spatially engineer such nanoscale conducting channels is still lacking. Here, the authors demonstrate patterning of topological boundary states in Sb2Te3 using a focused ion beam to create amorphous, topologically trivial regions.