High-resolution stereolithography using a static liquid constrained interface

Aftab A. Bhanvadia; Richard T. Farley; Youngwook Noh; Toshikazu Nishida

doi:10.1038/s43246-021-00145-y

Communications Materials (Apr 2021)

High-resolution stereolithography using a static liquid constrained interface

Aftab A. Bhanvadia,
Richard T. Farley,
Youngwook Noh,
Toshikazu Nishida

Affiliations

Aftab A. Bhanvadia: Department of Electrical and Computer Engineering Department, University of Florida
Richard T. Farley: Nanoptics, Inc.
Youngwook Noh: Nanoptics, Inc.
Toshikazu Nishida: Department of Electrical and Computer Engineering Department, University of Florida

DOI: https://doi.org/10.1038/s43246-021-00145-y
Journal volume & issue: Vol. 2, no. 1
pp. 1 – 7

Abstract

Read online

Stiction between polymerized layers and the constraining solid interface during stereolithography limits resolution. Here, a static inert liquid is used as a constraining interface to mitigate stiction, enabling high resolution parts to be fabricated with feature sizes spanning tens to thousands of microns.

Published in Communications Materials

ISSN: 2662-4443 (Online)
Publisher: Nature Portfolio
Country of publisher: United States
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials
Website: https://www.nature.com/commsmat/

About the journal