Nanomaterials (Apr 2019)

Graphene Schottky Junction on Pillar Patterned Silicon Substrate

  • Giuseppe Luongo,
  • Alessandro Grillo,
  • Filippo Giubileo,
  • Laura Iemmo,
  • Mindaugas Lukosius,
  • Carlos Alvarado Chavarin,
  • Christian Wenger,
  • Antonio Di Bartolomeo

DOI
https://doi.org/10.3390/nano9050659
Journal volume & issue
Vol. 9, no. 5
p. 659

Abstract

Read online

A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector.

Keywords