Growth and optical characteristics of high-quality ZnO thin films on graphene layers

Suk In Park; Youngbin Tchoe; Hyeonjun Baek; Jaehyuk Heo; Jerome K. Hyun; Janghyun Jo; Miyoung Kim; Nam-Jung Kim; Gyu-Chul Yi

doi:10.1063/1.4905488

APL Materials (Jan 2015)

Growth and optical characteristics of high-quality ZnO thin films on graphene layers

Suk In Park,
Youngbin Tchoe,
Hyeonjun Baek,
Jaehyuk Heo,
Jerome K. Hyun,
Janghyun Jo,
Miyoung Kim,
Nam-Jung Kim,
Gyu-Chul Yi

Affiliations

Suk In Park: Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 151-747, South Korea
Youngbin Tchoe: Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 151-747, South Korea
Hyeonjun Baek: Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 151-747, South Korea
Jaehyuk Heo: Advanced Development Team, LED Business, Samsung Electronics Co., Ltd., San#24 Nongseo-Dong, Giheung-Gu, Yongin-City, Gyeonggi-Do 446–711, South Korea
Jerome K. Hyun: Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 151-747, South Korea
Janghyun Jo: Department of Materials Science and Engineering, Seoul National University, Seoul 151–744, South Korea
Miyoung Kim: Department of Materials Science and Engineering, Seoul National University, Seoul 151–744, South Korea
Nam-Jung Kim: Department of Physics and Chemistry, Korea Military Academy, Seoul, South Korea
Gyu-Chul Yi: Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 151-747, South Korea

DOI: https://doi.org/10.1063/1.4905488
Journal volume & issue: Vol. 3, no. 1
pp. 016103 – 016103-6

Abstract

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We report the growth of high-quality, smooth, and flat ZnO thin films on graphene layers and their photoluminescence (PL) characteristics. For the growth of high-quality ZnO thin films on graphene layers, ZnO nanowalls were grown using metal-organic vapor-phase epitaxy on oxygen-plasma treated graphene layers as an intermediate layer. PL measurements were conducted at low temperatures to examine strong near-band-edge emission peaks. The full-width-at-half-maximum value of the dominant PL emission peak was as narrow as 4 meV at T = 11 K, comparable to that of the best-quality films reported previously. Furthermore, the stimulated emission of ZnO thin films on the graphene layers was observed at the low excitation energy of 180 kW/cm2 at room temperature. Their structural and optical characteristics were investigated using X-ray diffraction, transmission electron microscopy, and PL spectroscopy.

Published in APL Materials

ISSN: 2166-532X (Online)
Publisher: AIP Publishing LLC
Country of publisher: United States
LCC subjects: Technology: Chemical technology: Biotechnology; Science: Physics
Website: http://aplmaterials.aip.org

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