Compositional Modification of Epitaxial Pb(Zr,Ti)O3 Thin Films for High‐Performance Piezoelectric Energy Harvesters

Abstract

Abstract In this study, Piezoelectric energy harvesters (PEHs) are fabricated based on epitaxial Pb(Zr,Ti)O3 (PZT) thin films deposited by an RF magnetron sputtering with varied Zr/[Zr+Ti] ratio. For a compatibility with micro‐electromechanical systems, the epitaxial PZT thin films are deposited on Si substrates (PZT/Si). The morphotropic phase boundary (MPB) are formed in the compositional range of 0.44 ≤ Zr/[Zr+Ti] ≤ 0.51 of the epitaxial PZT/Si, which is far broader than that of the bulk PZT. Meanwhile, effective transverse piezoelectric coefficient (|e31,f|) values are evaluated by the direct and converse piezoelectric effects using the unimorph cantilever method. Among the compositions, the rhombohedral‐dominant MPB (MPB‐R) of Zr/[Zr+Ti] = 0.51 exhibits a direct |e31,f| of 10.1 C m−2 and a relative permittivity (εr) of 285, leading to the maximum figure of merit of 40 GPa in this study. On the other hand, the maximum converse |e31,f| of 14.0 C m−2 is measured from the tetragonal‐dominant MPB (MPB‐T) of Zr/[Zr+Ti] = 0.44. At a resonance frequency, the MPB‐T presents a high output power density of 301.5 µW−1/(cm2 g2) under an acceleration of 3 m−1 s−2, which is very promising for the high‐performance PEH applications.

Keywords

• epitaxial growth
• piezoelectric energy harvesters
• PZT composition
• Si substrates
• transverse piezoelectricity