Properties of boron layers deposited during boronisations in W7-X

Abstract

Boronisation was first used for wall conditioning in W7-X during the OP 1.2b operational period, which was characterized by the use of the fine-grain graphite Test Divertor Unit (TDU) and inertial cooling only. After this period, deposited layers were observed on all inner surfaces. Deposited layers were analyzed on 21 inner wall tiles using ion beam analysis methods, the deposited layers consisted mostly of boron with additional carbon and oxygen. During the operational period OP 2.1 with an actively water cooled divertor made of carbon fiber reinforced carbon, different materials were exposed during two individual boronisations using the multi-purpose manipulator. Deposited boronisation layers on the samples were analyzed using nuclear reaction analysis. The deposited layer thicknesses showed some variation depending on substrate material and surface roughness, but a systematic dependence on material and/or roughness was not observed. Under the typical boronisation conditions at W7-X, one A × h (Ampere times hour) of boronisation results in a boronisation layer with a thickness of about 30 ± 15 × 1015 B-atoms/cm2 (about 3 ± 1.5 nm) at the position of the multi-purpose manipulator. The oxygen gettering capacity of the layers is up to 0.5 – 0.9O/B.

Keywords

• W7-X
• Boronisation
• Wall conditioning
• Ion beam analysis
• Multi-purpose manipulator