Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement

Abstract

As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay. In this paper, we propose a wavefront-measurement-based method to detect the projection lens distortion in the lithographic system. By normalizing the coordinates of the Shack–Hartmann system with the image displacements represented in the Z2 and Z3 terms of Zernike coefficients, the offsets between the actual image points and the ideal image points can be determined. By offset collection at an array of 7 × 7 field points to establish an overdetermined system of equations, the proposed method can simultaneously detect the distortions of translation, magnification, rotation, decentering distortion, thin prism distortion, and third-order radial distortion. This distortion measurement method is highly flexible for distortion measurement with portable and compactly integrated sensors, enabling the real-time and cost-efficient measurement of wave aberration and distortion. For proof-of-concept experiments, a projection lens with a numerical aperture (NA) of 0.58 for i-line (365 nm) is used for experimental testing. The results reveal that the repeatability accuracy of distortion detection is 51 nm and the 72 h long-term reproducibility is 143 nm.

Keywords

• distortion
• lithography
• projection lens
• wavefront measurement