APL Materials (Mar 2015)

Order within disorder: The atomic structure of ion-beam sputtered amorphous tantala (a-Ta2O5)

  • Riccardo Bassiri,
  • Franklin Liou,
  • Matthew R. Abernathy,
  • Angie C. Lin,
  • Namjun Kim,
  • Apurva Mehta,
  • Badri Shyam,
  • Robert L. Byer,
  • Eric K. Gustafson,
  • Martin Hart,
  • Ian MacLaren,
  • Iain W. Martin,
  • Roger K. Route,
  • Sheila Rowan,
  • Jonathan F. Stebbins,
  • Martin M. Fejer

DOI
https://doi.org/10.1063/1.4913586
Journal volume & issue
Vol. 3, no. 3
pp. 036103 – 036103-6

Abstract

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Amorphous tantala (a-Ta2O5) is a technologically important material often used in high-performance coatings. Understanding this material at the atomic level provides a way to further improve performance. This work details extended X-ray absorption fine structure measurements of a-Ta2O5 coatings, where high-quality experimental data and theoretical fits have allowed a detailed interpretation of the nearest-neighbor distributions. It was found that the tantalum atom is surrounded by four shells of atoms in sequence; oxygen, tantalum, oxygen, and tantalum. A discussion is also included on how these models can be interpreted within the context of published crystalline Ta2O5 and other a-T2O5 studies.