AIP Advances (Feb 2014)

Temperature dependent dielectric function and the E0 critical points of hexagonal GaN from 30 to 690 K

  • Tae Jung Kim,
  • Soon Yong Hwang,
  • Jun Seok Byun,
  • Nilesh S. Barange,
  • Han Gyeol Park,
  • Young Dong Kim

DOI
https://doi.org/10.1063/1.4867094
Journal volume & issue
Vol. 4, no. 2
pp. 027124 – 027124-11

Abstract

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The complex dielectric function ɛ and the E0 excitonic and band-edge critical-point structures of hexagonal GaN are reported for temperatures from 30 to 690 K and energies from 0.74 to 6.42 eV, obtained by rotating-compensator spectroscopic ellipsometry on a 1.9 μm thick GaN film deposited on a c-plane (0001) sapphire substrate by molecular beam epitaxy. Direct inversion and B-splines in a multilayer-structure calculation were used to extract the optical properties of the film from the measured pseudodielectric function ⟨ɛ⟩. At low temperature sharp E0 excitonic and critical-point interband transitions are separately observed. Their temperature dependences were determined by fitting the data to the empirical Varshni relation and the phenomenological expression that contains the Bose-Einstein statistical factor.