Research on Optical and Mechanical Compatible Design Technology of Multilayer Films

Abstract

The stress’s accumulation will critically affect optical device stability, leading to components’ deviation and film peeling. Stress control techniques based on strain cancelation cannot precisely match film stress, and it is difficult to reduce the total stress of multilayer film to ultra-low levels. Existing software for film system design is mainly based on 2D design concepts such as wavelength-spectrum and does not consider 3D design concepts such as wavelength-spectrum-stress, but the stress parameter plays an essential role in film performance, and it is necessary to use it as an optimization index for film design. In this paper, we introduce mechanical synchronization design into film system design. The multilayer film’s optimal structure is precisely matched by the genetic algorithm, and an ultra-low stress and wide-spectrum optical film element is developed under the dual requirements of optical performance and mechanical performance. This technique incorporates computer-aided design and automatically seeks an optimal combination of layered film nanostructures through self-compiled optical and mechanical compatible design software. While ensuring invariant optical properties, it can effectively reduce the total stress of multilayer film. This can provide a new idea for film stress control.

Keywords

• genetic algorithm
• optical and mechanical compatible design
• ultra-low stress
• broadband anti-reflection film