Beilstein Journal of Nanotechnology (Dec 2017)

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

Dédalo Sanz-Hernández,
Amalio Fernández-Pacheco

Affiliations

Dédalo Sanz-Hernández: Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom
Amalio Fernández-Pacheco: Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom

DOI: https://doi.org/10.3762/bjnano.8.259
Journal volume & issue: Vol. 8, no. 1
pp. 2591 – 2591

Abstract

No abstracts available.

Published in Beilstein Journal of Nanotechnology

ISSN: 2190-4286 (Online)
Publisher: Beilstein-Institut
Country of publisher: Germany
LCC subjects: Technology: Chemical technology; Science: Physics
Website: http://www.beilstein-journals.org/bjnano/home/home.htm

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