Angle monitor of micromirror array for freeform illumination in lithography systems

Abstract

Source and mask optimization is a critical technique for further resolution enhancement in immersion lithography systems, wherein the optimal illumination source shape is widely generated by the micromirror array. Accordingly, the accurate achievement of the allocated angles of micromirrors is a key prerequisite for the implementation of arbitrary illumination patterns. In this paper, we propose an angle monitor to ensure the high-precision tilting of thousands of biaxial micromirrors. As one of the critical modules for closed-loop control of the two-dimensional micromirror array, the online monitor feeds the monitored high-precision tilt angle back to the processing system. The angle monitor mainly consists of the spot scanning module and the angle detection module. Among them, an f-θ lens and a Fourier transform lens with satisfied performances are designed and evaluated by CODE V. Furthermore, a galvanometer and the designed f-θ lens are adopted for the generation of the spot array irradiated on the electrostatic actuated mirrors. Meanwhile, the designed Fourier transform lenses are employed to detect the corresponding tilt angles. In addition, the performance of the proposed system is identified by simulations and experiments individually. It is demonstrated that the monitorable biaxial tilt range of the system is (−2.5°, +2.5°) with a repeatability of better than 0.005°. The large-format micromirror array can be monitored completely without optical cross-talk. Through the device, a 16 × 16 micromirror array is monitored, where the initial angle with no bias voltage applied is captured and the voltage–angle relation for individual micromirrors is obtained. In general, the proposed system can be utilized in the illumination system, providing an efficient and reliable method for complex source shape generation.