Suppression of Secondary Electron Emission by Vertical Graphene Coating on Ni Microcavity Substrate

Abstract

Suppression of secondary electron emission (SEE) from metal surfaces is crucial for enhancing the performance of particle accelerators, spacecraft, and vacuum electronic devices. Earlier research has demonstrated that either etching the metal surface to create undulating structures or coating it with materials having low secondary electron yield (SEY) can markedly decrease SEE. However, the effectiveness of growing vertical graphene (VG) on laser-etched metal surfaces in suppressing SEE remains uncertain. This study examined the collective impact of these methods by applying nanoscale arrays of VG coating using plasma-enhanced chemical vapor deposition on Ni substrates, along with the formation of micrometer-sized microcavity array through laser etching. Comparative tests conducted revealed that the SEY of the samples subjected to VG coating on a microcavity array was lower compared to samples with either only a microcavity array or VG coating alone. Additionally, the crystallinity of VG grown on substrates of varying shapes exhibited variations. This study presents a new method for investigating the suppression of SEE on metal surfaces, contributing to the existing body of knowledge in this field.

Keywords

• secondary electron emission
• laser etching
• microcavity array
• vertical graphene
• resorption effect