Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications

Abstract

This study presents the development of a ferrite core inductively coupled plasma (ICP) radio frequency (RF) ion source designed to improve the lifetime of ion sources in commercial ion implanters. Unlike existing DC methods, this novel approach aims to enhance the performance and lifetime of the ion source. We constructed a high-vacuum evaluation chamber to thoroughly examine RF ion source characteristics using a Langmuir probe. Comparative experiments assessed the extraction current of two upgraded ferrite core RF ion sources in a commercial ion implanter setting. Additionally, we tested the plasma lifetime of the ICP source and took temperature measurements of various components to verify the operational stability and efficiency of the innovative design. This study confirmed that the ICP RF ion source operated effectively under a high vacuum of 10−5 torr and in a high-voltage environment of 30 kV. We observed that the extraction current increased linearly with RF power. We also confirmed that BF3 gas, which presents challenging conditions, was stably ionized in the ICP RF ion sources.

Keywords

• implanter ion source
• ferrite core inductively coupled plasma radio frequency ion source
• ion source lifetime improvement
• RF ion source