Applied Sciences (Dec 2018)

All-Sputtering, High-Transparency, Good-Stability Coplanar Top-Gate Thin Film Transistors

  • Jianqiu Chen,
  • Xiuqi Huang,
  • Qunjie Li,
  • Zhiqiang Fang,
  • Honglong Ning,
  • Ruiqiang Tao,
  • Hongfu Liang,
  • Yicong Zhou,
  • Rihui Yao,
  • Junbiao Peng

DOI
https://doi.org/10.3390/app9010083
Journal volume & issue
Vol. 9, no. 1
p. 83

Abstract

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In this work, transparent, stable coplanar top-gate thin film transistors (TFTs) with an active layer of neodymium-doped indium oxide and zinc oxide (Nd-IZO) were successfully fabricated on a glass substrate by all sputtering processes. The devices with a post-annealing temperature of 400 °C exhibited good electrical performances with a saturation mobility (μsat) of 4.25 cm2·V−1·S−1, Ion/Ioff ratio about 106, Vth of −0.97 V and SS about 0.34 V/decade. Furthermore, the devices exhibited excellent negative and positive bias stability (NBS, PBS) of only a ΔVth shift of about −0.04 V and 0.05 V after 1 h, respectively. In addition, the devices showed high transparency about 96% over the visible-light region of 400–700 nm, which indicates a great potential in transparent displays.

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