Effect of Dual-Pulse Temporal Shaping on Ultraviolet Nanosecond Laser Damage of Fused Silica Surface in High Fluence Regime

Abstract

We present the effect of dual-pulse temporal shaping on the ultraviolet nanosecond laser damage characteristics of a fused silica exit surface in a high fluence regime. The pre- and post-pulse have the opposite effects on the damage behavior at a pulse delay of 20 ns. The pre-pulse irradiation significantly increases the main-pulse threshold, making it much higher than that of the single-pulse threshold, while the post-pulse has little effect on the main-pulse threshold. For near-threshold damage sites, the pre-pulse reduces the average damage size and depth, making them smaller than those of the single-pulse, while the post-pulse drastically increases the average size and depth, making them much larger than those of the single-pulse. The average size of the damage site is monotonously increased from 43.6 µm to 127.9 µm with increasing post-pulse energy. For the pre-pulse with a shape factor of 0.61, the damage threshold of the main pulse increases with increasing delay and nearly stabilizes after 10 ns. The underlying mechanism of the temporal-shaping effect on laser damage is discussed based on the applied precursor modification to absorption enhancement, which could provide insights for studying ultraviolet laser damage of fused silica optics.

Keywords

• temporal shaping
• damage in high fluence regime
• ultraviolet nanosecond laser
• fused silica