Surface topologies of thin aluminum films and absorbing properties of metal dielectric structures in the microwave range

Abstract

The paper presents experimental and theoretical results on the surface topography of thin aluminum films. The ambiguous topology dynamics of the thin-film structure is represented as a function of the increase in the bulk mass of the deposited material, which leads to an occasional rise in roughness reaching its maximum at a film thickness of 7 nm. At same time on the same thickness of the conductive layer the maximum of the absorption coefficient variability is observed. A theoretical analysis of the optical coefficients depending on the size of the conductive film substantiated the existence of extremes, but at smaller thicknesses.