Memristor Fabrication Through Printing Technologies: A Review

Abstract

Memristor got a significant attraction to be the next generation memory device due to its small size, simple architecture, high density, and low power consumption. A memristor is a passive two-terminal primary electronic device with a built-in non-volatile memory function that can be fabricated in a crossbar structure. In the literature, independent studies have been reported on memristor manufacturing concerning the spatial resolution of the crossbar electrodes, and thickness of the active layer. However, this paper presents a comprehensive review different from others by comparing all the additive manufacturing technologies and their limitations for the development of a memristor array. A detailed study is performed about the pattern resolution, active layer fabrication, commonly used substrates, and device encapsulation methods. This review will provide a strong basis for the researchers, especially those working in the field of printed memristor devices.

Keywords

• Memristor
• printing technologies
• thin films
• crossbar electrodes
• memristor fabrication