Micromachines (Mar 2021)

A New Approach for the Control and Reduction of Warpage and Residual Stresses in Bonded Wafer

  • Seyed Amir Fouad Farshchi Yazdi,
  • Matteo Garavaglia,
  • Aldo Ghisi,
  • Alberto Corigliano

DOI
https://doi.org/10.3390/mi12040361
Journal volume & issue
Vol. 12, no. 4
p. 361

Abstract

Read online

A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed.

Keywords