Selective-Area, Water-Free Atomic Layer Deposition of Metal Oxides on Graphene Defects

• Michael F. Mazza,
• Miguel Cabán-Acevedo,
• Harold J. Fu,
• Madeline C. Meier,
• Annelise C. Thompson,
• Zachary P. Ifkovits,
• Azhar I. Carim,
• Nathan S. Lewis

Affiliations

Michael F. Mazza

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Miguel Cabán-Acevedo

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Harold J. Fu

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Madeline C. Meier

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Annelise C. Thompson

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Zachary P. Ifkovits

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Azhar I. Carim

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States

Nathan S. Lewis

127-72, 210 Noyes Laboratory, Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California, United States