Micromachines (Oct 2023)

Compact Physics Hot-Carrier Degradation Model Valid over a Wide Bias Range

  • Stanislav Tyaginov,
  • Erik Bury,
  • Alexander Grill,
  • Zhuoqing Yu,
  • Alexander Makarov,
  • An De Keersgieter,
  • Mikhail Vexler,
  • Michiel Vandemaele,
  • Runsheng Wang,
  • Alessio Spessot,
  • Adrian Chasin,
  • Ben Kaczer

DOI
https://doi.org/10.3390/mi14112018
Journal volume & issue
Vol. 14, no. 11
p. 2018

Abstract

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We develop a compact physics model for hot-carrier degradation (HCD) that is valid over a wide range of gate and drain voltages (Vgs and Vds, respectively). Special attention is paid to the contribution of secondary carriers (generated by impact ionization) to HCD, which was shown to be significant under stress conditions with low Vgs and relatively high Vds. Implementation of this contribution is based on refined modeling of carrier transport for both primary and secondary carriers. To validate the model, we employ foundry-quality n-channel transistors and a broad range of stress voltages {Vgs,Vds}.

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