Electrical Contacts on Silicon Nanowires Produced by Metal-Assisted Etching: a Comparative Approach

Abstract

Abstract Silicon nanowires fabricated by metal-assisted chemical etching can present low porosity and a rough surface depending on the doping level of the original silicon wafer. In this case, wiring of silicon nanowires may represent a challenging task. We investigated two different approaches to realize the electrical contacts in order to enable electrical measurement on a rough silicon nanowire device: we compared FIB-assisted platinum deposition for the fabrication of electrical contact with EBL technique.

Keywords

• Metal-assisted chemical etching
• Nanosphere lithography
• Silicon nanowires
• Electrical contacts
• Electron beam lithography
• Focused ion beam