IEEE Photonics Journal (Jan 2019)

SiN-SOI Multilayer Platform for Prospective Applications at 2 μm

  • Jia Xu Brian Sia,
  • Wanjun Wang,
  • Xin Guo,
  • Jin Zhou,
  • Zecen Zhang,
  • Xiang Li,
  • Zhong Liang Qiao,
  • Chong Yang Liu,
  • Callum Littlejohns,
  • Graham T. Reed,
  • Hong Wang

DOI
https://doi.org/10.1109/JPHOT.2019.2952603
Journal volume & issue
Vol. 11, no. 6
pp. 1 – 9

Abstract

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Silicon photonics at the 2 μm waveband, specifically the 1.9 μm wavelength region is strategically imperative. This is due to its infrastructural compatibility (i.e., thulium-doped fiber amplifier, hollow-core photonic bandgap fiber) in enabling communications, as well as its potential to enable a wide range of applications. While the conventional Silicon-on-Insulator platform permits passive/active functionalities, it requires stringent processing due to high-index contrast. On the other hand, SiN can serve to reduce waveguiding losses via its moderate-index contrast. In this work, by demonstrating SiN passives and Si-SiN interlayer coupler with favorable performance, we extend the Si-SiN platform to the 1.9 μm wavelength region. We report waveguide propagation loss of 2.32 dB/cm. Following, trends in radiation loss with regards to bending radius is analyzed. A high performance 3-dB power splitter with insertion loss and bandwidth of 0.05 dB and 55 nm (1935-1990 nm) respectively is introduced. Lastly, Si-SiN transition loss as low as 0.04 dB is demonstrated.

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