Influence of the microstructure on the electrochemical properties of Al-Cr-N coatings deposited by co-sputtering method from a Cr-Al binary target

Abstract

In the present paper, aluminum chromium nitride (Al-Cr-N) films were deposited onto AISI H13 steel substrates by a reactive d.c magnetron co-sputtering system in an atmosphere of Ar/N2 (90/10) gas mixture from a binary target composed of chromium (99.95%) and aluminum (99.99%). Different powers (40, 50, 60, and 70 W) were applied to the target, in order to study the effect of this parameter and the sputtering yield of binary target, on the microstructure and the electrochemical properties of the Al-Cr-N coatings. The corrosion behavior in 3.5 wt. (%) NaCl solution was investigated by electrochemical corrosion tests (Tafel polarization curves and Electrochemical Impedance Spectroscopy (EIS)), and the chemical composition, microstructure and the absorption bands by means of Energy Dispersive X-ray Spectroscopy (EDX), X-ray diffractometry (XRD) and Fourier Transform Infrared Spectroscopy (FTIR), respectively. EIS results showed that the Al-Cr-N coating deposited at 40 W, exhibited the lower porosity and the highest polarization resistance, and subsequently, when the power applied to the binary target increased, the corrosion rate and the porosity increase.

Keywords

• thin films
• electrochemical properties
• co-sputtering
• aluminum chromium nitride