Journal of Synchrotron Radiation (May 2024)

Development of dual-beamline photoelectron momentum microscopy for valence orbital analysis

  • Kenta Hagiwara,
  • Eiken Nakamura,
  • Seiji Makita,
  • Shigemasa Suga,
  • Shin-ichiro Tanaka,
  • Satoshi Kera,
  • Fumihiko Matsui

DOI
https://doi.org/10.1107/S1600577524002406
Journal volume & issue
Vol. 31, no. 3
pp. 540 – 546

Abstract

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The soft X-ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal-incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal-incidence geometry was obtained at the same sample position as the soft X-ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s-polarized) light excitations from BL7U in addition to horizontal linearly polarized (p-polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization-dependent transition-matrix-element analysis.

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