Tuning Electrochemical Bistability by Surface Area Blocking in the Cathodic Deposition of Copper

• Júlia Rospendowiski,
• Maria R. Pinto,
• Cristian Hessel,
• Elton Sitta,
• Raphael Nagao

Affiliations

Júlia Rospendowiski

Institute of Chemistry, University of Campinas, Campinas, Sao Paulo, Brazil

Maria R. Pinto

Institute of Chemistry, University of Campinas, Campinas, Sao Paulo, Brazil

Cristian Hessel

Department of Chemistry, Federal University of Sao Carlos, Sao Carlos, Sao Paulo, Brazil

Elton Sitta

Department of Chemistry, Federal University of Sao Carlos, Sao Carlos, Sao Paulo, Brazil

Raphael Nagao

Institute of Chemistry, University of Campinas, Campinas, Sao Paulo, Brazil