Communications Materials (Mar 2023)

Defect engineering of silicon with ion pulses from laser acceleration

  • Walid Redjem,
  • Ariel J. Amsellem,
  • Frances I. Allen,
  • Gabriele Benndorf,
  • Jianhui Bin,
  • Stepan Bulanov,
  • Eric Esarey,
  • Leonard C. Feldman,
  • Javier Ferrer Fernandez,
  • Javier Garcia Lopez,
  • Laura Geulig,
  • Cameron R. Geddes,
  • Hussein Hijazi,
  • Qing Ji,
  • Vsevolod Ivanov,
  • Boubacar Kanté,
  • Anthony Gonsalves,
  • Jan Meijer,
  • Kei Nakamura,
  • Arun Persaud,
  • Ian Pong,
  • Lieselotte Obst-Huebl,
  • Peter A. Seidl,
  • Jacopo Simoni,
  • Carl Schroeder,
  • Sven Steinke,
  • Liang Z. Tan,
  • Ralf Wunderlich,
  • Brian Wynne,
  • Thomas Schenkel

DOI
https://doi.org/10.1038/s43246-023-00349-4
Journal volume & issue
Vol. 4, no. 1
pp. 1 – 10

Abstract

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Defect engineering and doping of semiconductors by ion irradiation are essential in large-scale integration of electronic devices. Here, intense ion pulses from a laser-accelerator, with flux levels up to 1022 ions cm-2 s-1, are used to induce and optimize silicon color centers and photon emitters in the telecom band.