APL Materials (Feb 2019)

Thin-film stabilization of LiNbO3-type ZnSnO3 and MgSnO3 by molecular-beam epitaxy

  • Kohei Fujiwara,
  • Hiroya Minato,
  • Junichi Shiogai,
  • Akihito Kumamoto,
  • Naoya Shibata,
  • Atsushi Tsukazaki

DOI
https://doi.org/10.1063/1.5054289
Journal volume & issue
Vol. 7, no. 2
pp. 022505 – 022505-6

Abstract

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In polar crystals, cooperative ionic displacement produces a macroscopic spontaneous polarization. Among such polar materials, LiNbO3-type wide bandgap oxides are particularly appealing because they offer useful ferroelectric properties and also potentially lead to multiferroic materials. Using molecular-beam epitaxy, we investigated the thin-film growth of high-pressure phase LiNbO3-type ZnSnO3 and discovered a polar oxide candidate, MgSnO3. We found that LiNbO3-type substrates play an essential role in the crystallization of these compounds, though corundum-type Al2O3 substrates also have the identical crystallographic arrangement of oxygen sublattice. Optical transmittance and electrical transport measurements revealed their potential as a transparent conducting oxide. Establishment of a thin-film synthetic route would be the basis for exploration of functional polar oxides and research on conduction at ferroelectric interfaces and domain walls.