On the Path to High-Temperature Josephson Multi-Junction Devices

Abstract

We report our progress in the high-temperature superconductor (HTS) Josephson junction fabrication process founded on utilizing a focused helium ion beam damaging technique and discuss the expected device performance attainable with the HTS multi-junction device technology. Both the achievable high value of characteristic voltage \begin{document}$V_c=I_c R_N $\end{document} of Josephson junctions and the ability to design a large number of arbitrary located Josephson junctions allow narrowing the existing gap in design abilities for low-temperature superconductor (LTS) and HTS circuits even with using a single YBa2Cu3O7–x film layer. A one-layer topology of active electrically small antenna is suggested and its voltage response characteristics are considered.

Keywords

• josephson junctions
• high-temperature superconductors
• yba2cu3o7–x (ybco)
• focused helium ion beam fabrication technique
• josephson multi-junction devices
• superconducting quantum interference device
• active electrically small antenna