Nanosphere Lithography-Based Fabrication of Spherical Nanostructures and Verification of Their Hexagonal Symmetries by Image Analysis

Abstract

Nanosphere lithography (NSL) is a cost- and time-effective technique for the fabrication of well-ordered large-area arrays of nanostructures. This paper reviews technological challenges in NSL mask preparation, its modification, and quality control. Spin coating with various process parameters (substrate wettability, solution properties, spin coating operating parameters) are discussed to create a uniform monolayer from monodisperse polystyrene (PS) nanospheres with a diameter of 0.2–1.5 μm. Scanning electron microscopy images show that the PS nanospheres are ordered into a hexagonal close-packed monolayer. Verification of sphere ordering and symmetry is obtained using our open-source software HEXI, which can recognize and detect circles, and distinguish between hexagonal ordering and defect configurations. The created template is used to obtain a wide variety of tailor-made periodic structures by applying additional treatments, such as plasma etching (isotropic and anisotropic), deposition, evaporation, and lift-off. The prepared highly ordered nanopatterned arrays (from circular, triangular, pillar-shaped structures) are applicable in many different fields (plasmonics, photonics, sensorics, biomimetic surfaces, life science, etc.).

Keywords

• nanosphere lithography
• self-assembly
• hexagonal symmetry
• plasma etching
• image analysis
• defect detection