Scientific Reports (Oct 2024)
Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films
- Pauline Kümmerl,
- Sebastian Lellig,
- Amir Hossein Navidi Kashani,
- Marcus Hans,
- Peter J. Pöllmann,
- Lukas Löfler,
- Ganesh Kumar Nayak,
- Damian M. Holzapfel,
- Szilárd Kolozsvári,
- Peter Polcik,
- Peter Schweizer,
- Daniel Primetzhofer,
- Johann Michler,
- Jochen M. Schneider
Affiliations
- Pauline Kümmerl
- Materials Chemistry, RWTH Aachen University
- Sebastian Lellig
- Materials Chemistry, RWTH Aachen University
- Amir Hossein Navidi Kashani
- Materials Chemistry, RWTH Aachen University
- Marcus Hans
- Materials Chemistry, RWTH Aachen University
- Peter J. Pöllmann
- Materials Chemistry, RWTH Aachen University
- Lukas Löfler
- Materials Chemistry, RWTH Aachen University
- Ganesh Kumar Nayak
- Materials Chemistry, RWTH Aachen University
- Damian M. Holzapfel
- Materials Chemistry, RWTH Aachen University
- Szilárd Kolozsvári
- Plansee Composite Materials GmbH
- Peter Polcik
- Plansee Composite Materials GmbH
- Peter Schweizer
- Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures
- Daniel Primetzhofer
- Department of Physics and Astronomy, Uppsala University
- Johann Michler
- Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures
- Jochen M. Schneider
- Materials Chemistry, RWTH Aachen University
- DOI
- https://doi.org/10.1038/s41598-024-75854-8
- Journal volume & issue
-
Vol. 14,
no. 1
pp. 1 – 1
Abstract
No abstracts available.
